NSTC Basic Research Core Facility
Nanofabrication Field
Double Side Mask Aligner
# Jiaotong University Campus, Nano Center, Instrument Location: Laboratory 137, 1st Floor, Solid State Electronic Systems Building
Oxidation & Diffusion Furnaces
OXIDATION & DIFFUSION FURNACES
Brand Model: Senji SJ-CA1200-D4
Instrument expert: Professor Liu Bocun (ext. 52994)
Equipment management personnel: Mr. Lin Shengqin (extension 55668, 55610)
Instrument location: Room 121, Solid State Electronic Systems Building
Brand Model: Senji SJ-CA1200-D4
Instrument expert: Professor Liu Bocun (ext. 52994)
Equipment management personnel: Mr. Lin Shengqin (extension 55668, 55610)
Instrument location: Room 121, Solid State Electronic Systems Building
Photomask production system (graphics generation system)
Photomask Production System Graphic Generation System Instrument Expert: Prof. Li Peiwen, ext. 54210 Instrument Consulting and Operation Services: Mr. Cai Qingxiang, Mr. Huang Guohua Buildings 139 and 118
Group III or Five Molecular Beam Epitaxy System
III-V MOLECULAR BEAM EPITAXY SYSTEM Brand model: Veeco Modular GEN II solid source III-V MBE Instrument expert: Professor Lin Shengdi extension 31240 mailbox sdlin@mail.nctu.edu.tw Instrument consultation and operation service: Wu Chujun…
High Vacuum Deposition System
High Vacuum Deposition System Sputtering System A Sputtering System B
Atomic Layer Chemical Vapor Deposition System
Atomic Layer Chemical Vapor Deposition System Solid State Electronic System Building Room 129 Instrument Expert: Professor Zhao Tiansheng Extension: 31367 Technician: Mr. Zhan Jiaqi Technician Extension: 55662(O), 55616(L)
Thermal Evaporation System
Code: SEMI00001300 Field: Nano Process Name: Thermal Evaporation Coater Thermal Evaporation Coater Dual E-Gun Evaporation System A Dual E-Gun Evaporation System A Dual E-Gun Evaporation System B Gun Evaporation System B) Instrument expert: Zheng Yuting...
導電性材料活性離子蝕刻系統 (HDP-RIE, Si Deep-RIE, Shallow Si RIE)
高密度活性離子蝕刻系統 (High Density Plasma Reactive Ion Etching System, HDP-RIE)
矽深蝕刻系統 (Si Deep-RIE)
矽淺蝕刻系統 (Shallow Si RIE)
儀器位置:固態電子系統大樓 1樓116…
Focused ion beam and electron beam microscopy system Dual beam System FIB
Instrument location: Room 213, Engineering Building Six. Instrument experts: Professor Wu Yaoquan extension 31555, Professor Cui Bingyue extension 31570; Instrument and equipment management personnel: Ms. Liu Yueen extension 55658/55368
Cold Field Emission Scanning Electron Microscope and Energy Dispersion Analysis Instrument
Instrument location: Laboratory in Room 212, 2/F, Engineering Building 6 (TEL: 55337) Instrument expert: Prof. Tan Zhishan, ext. 54146; Instrument consultation and operation service: Ms. Fan Xiulan, ext. 55337/55672
Dielectric Reactive Ion Etching System (RIE-400iP, RIE-200L)
Instrument location: Dielectric Material Reactive Ion Etching System A (Dielectric Material RIE-400iP) Dielectric Material Reactive Ion Etching System B (Dielectric Materials Reactive Ion Etching System, RIE…
Plasma Assisted Chemical Vapor Deposition System PECVD
Instrument location: Laboratory 116, 1st Floor, Solid State Electronic System Building (TEL: 55666) Instrument Expert: Prof. Lin Hongzhi, ext. 54193; Instrument consultation and operation service: Mr. Lai Wenyan, ext. 55606/55616
Low pressure chemical vapor deposition system LPCVD
Low Pressure Chemical Vapor Deposition (LPCVD) Brand Model: SJ-10301001-1 Instrument Expert: Professor Liu Bocun, ext. 52994 Instrument consultation and operation service: Mr. Lai Wenyan, ext. 55606, 55616 Instrument location: Experiment 127, 1st Floor, Solid State Electronic System Building Room ext 55616